Thank you for the opportunity to review and provide feedback on the nomination of Development of 193-nm Projection Photolithography for an IEEE Milestone. The following are my comments related to the requested three aspects of the proposal.
1) Is the suggested wording of the Plaque Citation accurate?
Yes, I believe that the plaque citation is fully accurate, and captures the technical contribution for the IEEE Milestone.
2) Is the evidence presented in the proposal of sufficient substance and accuracy to support the Citation?
Yes. The evidence describes the invention and development of 193-nm Projection Lithography at MIT Lincoln Laboratory, and provides a clear historical outline of the milestones that occurred as a part of that development. These included several breakthroughs at MIT Lincoln Laboratory over approximately a decade, including the generation of patterns using 193-nm projection sources, development of photoresist technology, and demonstration of the technology to fabricate electronic devices. The evidence is well documented in the science and engineering literature through peer-reviewed publications. In particular, this spans all the way from the early demonstration of high-resolution patterning with 193 nm projection lithography (D.J. Ehrlich, J.Y. Tsao, and C.O. Bozler, “Submicrometer patterning by projected excimer-laser-beam induced chemistry,” Journal of Vacuum Science and Technology B, vol. 3, no. 1, pp. 1-8, Jan/Feb 1985) to the later stages of demonstrating that 193 nm lithography would serve as a practical solution to high-resolution patterning for semiconductor device manufacturing (M. Rothschild, J.A. Burns, S.G. Cann, A.R. Forte, C.L. Keast, R.R. Kunz, S.C. Palmateer, J.H.C. Sedlacek, R. Uttaro, A. Grenville, and D. Corliss, “How practical is 193 nm lithography?” Journal of Vacuum Science and Technology B, vol. 14, no. 6, pp. 4157-4161, Nov/Dec 1996.).
3) Does the proposed milestone represent a significant technical achievement?
Yes. Today's computer age, information age, and the Internet of Things is all based on the foundational semiconductor microelectronics technology. The progression of semiconductor technology and Moore's Law have relied on the ability to scale device dimensions. The 193 nm projection lithography work at MIT Lincoln Laboratory was a milestone in providing a new approach to reducing feature sizes (device dimensions) to the submicron region, was widely adopted by the semiconductor industry, and paved the way to enable the progression of Moore's Law and the broad impact of semiconductor microelectronics.
Best Regards, Jamie
-- University of Delaware Jamie D. Phillips (he/him/his) Professor and Department Chair Electrical and Computer Engineering Department University of Delaware 142 Evans Hall, Newark, DE 19716 firstname.lastname@example.org