Milestone-Proposal talk:Czochralski

From IEEE Milestones Wiki

Advocates and reviewers will post their comments below. In addition, any IEEE member can sign in with their ETHW login (different from IEEE Single Sign On) and comment on the milestone proposal's accuracy or completeness as a form of public review.

Milestone Citation -- Jason.k.hui (talk) 00:33, 19 February 2018 (UTC)

In the last sentence of the citation, should the last word "eletronics" be "electronics"?

Re: Milestone Citation -- Malin (talk) 09:59, 6 March 2018 (UTC)

Yes, you are right

-- JaninA (talk) 00:24, 27 February 2018 (UTC)

The Czochralski method of Crystal Growth definitely deserves the IEEE Milestone, and the proposal is well put together and substantiated. It would benefit from adding few extra commas, spaces, checking for typos (Jason found one) and possibly numbering the plagues in the section describing the security of the sites.

Re: -- Malin (talk) 10:05, 6 March 2018 (UTC)

We are planning to install the plaque in the Hall of Main Building, Warsaw University of Technology and it will be monitored by the Academic Guard all the time.

More of the story -- Allisonmarsh (talk) 17:51, 2 March 2018 (UTC)

Wikipedia calls it the Czochralski Process. Is there any consensus on whether it is a process or a method?

As many of you know, I generally don't like naming individuals in plaques because the plaque is supposed to honor the technological achievement, not the person. However, in this case the achievement has become eponymous with the person, so I have no problem with it.

For the average, non-engineer passerby, I really like the story about how he accidentally made the discovery. I think the citation could also benefit from describing more of the applications and why this is so important.

Re: -- Malin (talk) 10:26, 6 March 2018 (UTC)

We agree with you that the process of crystal growth is based on Czochralski's method. So in fact there are consensus between process and method named Czochralski. Unfortunately the text on a plaque must be very limited. To mark only greater scope of application of Czochralski invention we added in a last sentence that it "enabled development of electronic semiconductor devices and modern electronics.”

Accompanying Documentation -- CSchlombs (talk) 19:45, 7 March 2018 (UTC)

I understand that three plaques are supposed to be installed, two in Poland and one in Germany.

However, in the accompanying documentation on ETHW, in the section "What obstacles (technical, political, geographic) needed to be overcome?", it says: "This is planned to expose and to install IEEE Milestone plaque in two locations in 2 countries: Poland and Germany."

Shouldn't this be "three locations in 2 countries"?